Description
The Emitech K550X Sputter Coater system employs a magnetron target assembly to enhance the efficiency of processes using low voltages and producing a fine grain cool sputtering without the need to cool the target specimen stage. The specimen stage is suitable for a range of specimens and stubs, with pre-selectable parameters and automatic control for repeatable film thickness depositions.
The K550X features a 60mm diameter by 0.1mm thick, gold, quick-change target enabling optimum performance. The parameters can be pre-set, including the gas bleed needle valve that has electromagnetic valve back up.
Features of the Emitech K550X Sputter Coater:
- Deposition Range: 0-50mA
- Deposition Rate: 0-25nm/min
- Fully automatic control
- Low voltage sputtering
- High resolution fine coating
- Pre-selectable parameters and automatic control
- Special rotating stage with full tilt facility
- Independent vacuum pump
- Even and repeatable thickness deposition
- Easy loading and unloading of specimens
- User-friendly control panel
- 60mm diameter by 0.1mm thick, gold, quick-change target
- 165mm Diameter chamber
- Specimen stage – suitable for a range of specimens and stubs
